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• W2073622492 abstract "Co–Sb thin films with an Sb content in the range 65–76 at.%, were deposited on a thermally oxidized Si (100) substrate preheated at 200 °C using radio-frequency co-sputtering. Evaluation using scanning electron microscopy images and X-ray diffraction reveals that the films were polycrystalline, with a grain size in the range 100–250 nm. Energy-dispersive spectroscopy analysis indicates single-phase CoSb2 and CoSb3 films, as well as multiphase thin films with either CoSb2 or CoSb3 as the dominant phase. The electrical and thermoelectric properties were measured and found to be strongly dependent on the observed phases and the defect concentrations. The CoSb2 thin films were found to exhibit a significant n-type thermoelectric effect, which, coupled with the very low electrical resistivity, resulted in a larger power factor than that of the CoSb3 thin films. We find power factors of 0.73 mWm− 1 K− 2 and 0.67 mWm− 1 K− 2 for the CoSb2 and CoSb3 thin films, respectively." @default.
• W2073622492 created "2016-06-24" @default.
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• W2073622492 date "2015-07-01" @default.
• W2073622492 modified "2023-10-18" @default.
• W2073622492 title "Thermoelectric properties of cobalt–antimonide thin films prepared by radio frequency co-sputtering" @default.
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• W2073622492 doi "https://doi.org/10.1016/j.tsf.2015.01.037" @default.
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