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- W2073648045 abstract "The conventional time-of-flight technique for measuring drift velocity in high mobility semiconductors is limited to relatively thick (> 200 μm) and high resistivity material. The microwave time-of-flight technique described here allows thin (∼ 10 μm) low resistivity epitaxial layers to be measured with greater accuracy than is afforded by the conventional technique. The new experimental method is applied to the measurement of electron drift velocity in n-type GaAs at room temperature. The method, and its theory, is described in detail and its advantages and limitations are discussed." @default.
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- W2073648045 title "Drift mobility measurements in thin epitaxial semiconductor layers using time-of-flight techniques" @default.
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- W2073648045 doi "https://doi.org/10.1016/0038-1101(74)90028-8" @default.
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