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- W2073648768 abstract "The laser-CVD of silicon oxide films on silicon substrates has been carried out using a CW-CO2 laser in a parallel configuration, and with SiH4 and N2O as precursor gases. In this paper we report the influence of the reactant partial pressures on the film growth rate. The individual apparent orders of the chemical reaction for SiH4 and N2O have been determined." @default.
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- W2073648768 date "1993-05-01" @default.
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- W2073648768 title "The role of silane and N2O in the CO2 laser-CVD of silicon oxide films" @default.
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- W2073648768 doi "https://doi.org/10.1016/0169-4332(93)90519-h" @default.
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