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- W2073661804 abstract "Silicon and beryllium ions have been implanted at 300 °K into iron doped semi-insulating InP substrates. In all cases a threshold dose was found in the high 1011 cm−2 to mid 1012 cm−2 range which depends both on the substrate and the ion being implanted. A simple model identifies the threshold fluence for n-type implantation with the excess iron in the substrate and the threshold for p-type implants with the background impurities in the substrate." @default.
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- W2073661804 date "1981-05-01" @default.
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- W2073661804 title "Dose thresholds for implantation of iron-doped indium phosphide" @default.
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- W2073661804 doi "https://doi.org/10.1063/1.329157" @default.
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