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- W2073679780 abstract "Abstract Detailed depth profiles of hydrogen and oxygen have been measured in samples of thin films of a-Si: H produced by dc magnetron glow discharge techniques. The resonant capture reaction 1H(19F, αγ)16O at E19v = 6.417 MeV was used for hydrogen profile measurements, and resonant α scattering at Eα = 3.0359 MeV was used for oxygen. Contrasting results reflecting the different fabrication conditions were obtained and these were correlated with measured electrical properties." @default.
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- W2073679780 date "1986-04-01" @default.
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- W2073679780 title "Depth profiles of hydrogen and oxygen in hydrogenated amorphous silicon thin films" @default.
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- W2073679780 doi "https://doi.org/10.1016/0168-583x(86)90356-3" @default.
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