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- W2073751572 abstract "We deposit niobium nitride (NbN) thin films on Si(1 0 0) substrates using direct current (dc) reactive magnetron sputtering in discharging a mixture of N2 and Ar gas, and explore the effects of nitrogen flow rate ( ) on the preferred orientation (PO), phase transition and mechanical properties for the obtained films by virtue of x-ray diffraction and nanoindentation measurements. We find that with increasing the biaxial compressive stress increases, which leads to a pronounced change in the PO and phase structure for the film. A phase transition from δ (face-centred cubic) to δ' (hexagonal) occurs in the film as the biaxial stress increases to a critical value of about 3.9 GPa, which can be attributed to a decrease in the strain energy. With a further increase in the biaxial stress, the fraction of the δ' phase in the film increases, and finally the film only has a single phase, δ'-NbN, resulting in a consistent increase in hardness." @default.
- W2073751572 created "2016-06-24" @default.
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- W2073751572 date "2008-12-18" @default.
- W2073751572 modified "2023-10-18" @default.
- W2073751572 title "Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering" @default.
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- W2073751572 doi "https://doi.org/10.1088/0022-3727/42/3/035304" @default.
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