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- W2073756510 abstract "We report on AlGaN multiple-quantum-well light-emitting diodes over sapphire with peak emission at 325 nm. A pulsed-atomic-layer-epitaxy growth process was used to improve the material quality of the AlN buffer and the AlN/AlGaN strain-relief layers for reducing the nonradiative recombination. In addition, a modified device epilayer structure was used to improve the carrier confinement and the hole injection. A 40% improvement of external quantum efficiency is obtained, resulting in record high optical powers of 10.2 mW at a pulsed pump current of 1 A." @default.
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- W2073756510 date "2003-04-14" @default.
- W2073756510 modified "2023-10-03" @default.
- W2073756510 title "Improved performance of 325-nm emission AlGaN ultraviolet light-emitting diodes" @default.
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- W2073756510 doi "https://doi.org/10.1063/1.1569040" @default.
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