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• W2073855183 abstract "We have studied surface roughness scaling of ZnO:Al thin films grown by rf magnetron sputtering of a compound target within framework of the dynamic scaling theory using atomic force microscopy. We have observed a crossover in scaling behavior of surface roughness at a deposition time of 25 min. Both the regimes are characterized by power-law dependence of local surface width w(r,t) on deposition time for small r, typical of anomalous scaling. The scaling exponents for the first regime indicate the existence of a new dynamics. For t≥25 min, the films follow super-rough scaling behavior with global exponents α=1.5±0.2 and β=1.03±0.01, and local exponents αlocal=1 and βlocal=0.67±0.05. The anomaly in the scaling behavior of the films is discussed in terms of the shadowing instability and bombardment of energetic particles during growth of the films." @default.
• W2073855183 created "2016-06-24" @default.
• W2073855183 creator A5025584009 @default.
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• W2073855183 date "2009-09-01" @default.
• W2073855183 modified "2023-10-17" @default.
• W2073855183 title "Scaling of surface roughness in sputter-deposited ZnO:Al thin films" @default.
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• W2073855183 doi "https://doi.org/10.1063/1.3212968" @default.
• W2073855183 hasPublicationYear "2009" @default.
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