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• W2073907662 abstract "A simple, inexpensive, efficient, and scalable method to create air-stable organic surface passivation layers on silicon using a vapor-phase treatment is demonstrated. A variant of initiated chemical vapor deposition is used to synthesize a thin film that acts as both a passivation layer and an antireflective coating. The lowest surface recombination velocity reported to date is achieved and maintained during prolonged exposure to air." @default.
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• W2073907662 date "2013-01-28" @default.
• W2073907662 modified "2023-10-16" @default.
• W2073907662 title "Organic Vapor Passivation of Silicon at Room Temperature" @default.
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• W2073907662 doi "https://doi.org/10.1002/adma.201204382" @default.
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