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- W2074034911 abstract "The chemisorption of atomic and molecular oxygen on the (100) surface of silicon has been studied by the MNDO method in the framework of a cluster approach. The results show that both atomic and molecular chemisorption are exothermic and occur preferentially at bridge positions. For the atomic process an energy minimum for the open site has been found below the surface, between the first and second layer. Dissociative chemisorption is anyway preferred by a thermodynamic point of view, but involves an activation energy. As a consequence molecular chemisorption could also be observed." @default.
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- W2074034911 date "1985-10-01" @default.
- W2074034911 modified "2023-09-23" @default.
- W2074034911 title "Chemisorption of atomic and molecular oxygen on the (100) surface of silicon; a theoretical study" @default.
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- W2074034911 doi "https://doi.org/10.1016/0039-6028(85)90900-8" @default.
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