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- W2074123576 abstract "Carrier gas flow in a rapid thermal chemical vapor deposition (RTCVD) reactor was studied using flow visualization and laser induced Rayleigh light scattering (RLS). The flow field consists of a downward axisymmetric jet of carrier gas impinging on a wafer which undergoes transient heating. Flow visualization results showed three stable flow regimes as the surface rose from ambient to high temperature: momentum dominated, buoyancy dominated, and a second momentum dominated regime at high temperature; each separated by unstable, chaotic flows. RLS temperature measurements provided transient gas temperature histories, documenting flow visualization results. Regions of momentum dominated, buoyancy dominated, and unstable flows were defined as a function of Grashof number, Reynolds number, pressure, and wafer temperature." @default.
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- W2074123576 date "2002-05-10" @default.
- W2074123576 modified "2023-09-27" @default.
- W2074123576 title "Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor" @default.
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- W2074123576 doi "https://doi.org/10.1115/1.1469525" @default.
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