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- W2074131506 abstract "An atmospheric pressure, inductively coupled, argon-oxygen RF plasma process has been used to prepare, in-situ, superconducting Bi2Sr2Can−1CunOx thin films. Film properties have been enhanced by exposing the grown film, in-situ, to the same argon-oxygen plasma used for its deposition. This is achieved by switching off the atomized precursor nitrate solution to the plasma torch. Tc's of 76 K and Jc's of 1.3 × 105 A/cm2 at 60 K and zero field have been achieved in the in-situ, Bi2Sr2Ca1Cu2Ox films. Bi2Sr2Ca2Cu3Ox films with Tc's of 100 K and Jc's of 1 × 105 A/cm2 at 77 K and zero field have also been grown. The effects of film exposure to the plasma for different time periods and RF power levels are discussed. The effects of deposition parameters, such as substrate temperature, bismuth content, solution concentration and phase control, are analyzed. Finally, the critical current behavior of the films under a external magnetic field of up to 5 T is reported." @default.
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- W2074131506 date "1993-06-01" @default.
- W2074131506 modified "2023-09-29" @default.
- W2074131506 title "RF plasma deposition and in-situ property enhancement of Bi2Sr2Can−1CunOx thin films" @default.
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- W2074131506 doi "https://doi.org/10.1016/0921-4534(93)90729-a" @default.
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