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- W2074304560 abstract "The influence of secondary electron blur on pattern resolution is evaluated using the pattern replication technique on a mask. A 30 nm L&S (line and space) pattern can be formed, even if the secondary electron blur caused by X-rays with the mean wavelength of 7.9 Å exists. We found that the influence of image degradation due to blurs, such as secondary electron blurring and the resist process, does not appear at more than 35 nm with a mean wavelength in the range of 7.1–7.6 Å. A 50 nm L&S pattern can be resolved using an X-ray with mean wavelength of 4.2 Å, and there is no significant discrepancy between the experimental results and the simulated images when secondary electron blur is calculated by the Monte Carlo method." @default.
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- W2074304560 date "2003-06-30" @default.
- W2074304560 modified "2023-10-17" @default.
- W2074304560 title "Pattern Resolution in X-ray Lithography Using Pattern Replication Technique on a Mask" @default.
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- W2074304560 doi "https://doi.org/10.1143/jjap.42.3796" @default.
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