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• W2074399267 abstract "We investigated the effect of post-exposure delay (PED) for poly[2-(2-hydroxyethyl)carboxylate-5-norbornene-co-2-t-butylcarboxylate-5-norborene-co-2-carboxylic acid-5-norborene-co-maleic anhydride] [poly(HNC/BNC/NC/MA)] resist film, which formulated with photoacid generator (PAG) under the several solvents. The solvents used in this study were propylene glycol methyl ether acetate (PGMEA), isobutyl methyl ketone (IBMK), 2-heptanone (2-H), and (2-methoxy)ethyl acetate (MEA). We have introduced a new concept of rheological approach to explain the solvent effect for PED by using rheometer and light scattering equipment. In the PGMEA solvent, the resist solution shows Newtonian behavior, but the other resist solutions show shear-thinning behavior. The resist film prepared by the shear-thinning solvent exhibited good PED stability. In order to explain these results, we conjectured that the resist polymer existed in long-rod shape under the specific solvent and high shear rate. Also, we could obtain 0.16 μm L/S patterns in a severely amine-contaminated environment (about 35 ppb) after 30 min PED by using this method. © 2000 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 38: 148–153, 2000" @default.
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• W2074399267 date "2000-01-01" @default.
• W2074399267 modified "2023-09-27" @default.
• W2074399267 title "Post-exposure delay stability for 193 nm single-layer photoresist: Solvent effect" @default.
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• W2074399267 doi "https://doi.org/10.1002/(sici)1099-0488(20000101)38:1<148::aid-polb18>3.0.co;2-u" @default.
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