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- W2074401360 abstract "Silicon surface nanoholes, that are small pits introduced spontaneously on electron exit surfaces of silicon foils under electron irradiation, are excavated at a constant rate with increasing electron dose. On the other hand, surface nanoholes on electron entrance surfaces become shallow under electron irradiation. The mechanism for the excavation and shallowing of surface nanoholes is discussed in terms of the movement of surface vacancies assisted by irradiating electrons." @default.
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- W2074401360 date "2006-06-15" @default.
- W2074401360 modified "2023-10-18" @default.
- W2074401360 title "Excavation rate of silicon surface nanoholes" @default.
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- W2074401360 doi "https://doi.org/10.1063/1.2206693" @default.
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