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- W2074437611 endingPage "702" @default.
- W2074437611 startingPage "698" @default.
- W2074437611 abstract "The use of doped polysilicon films in the manufacture of MOS circuits has become a very important part of semiconductor technology. In this report however, it is shown that defect generation in the polysilicon doping/activation process can seriously impact gate oxide quality. Regardless of whether the doping process is by ion implant, in situ dopant deposition with polysilicon, or spin‐on source diffusion into polysilicon, capacitor yields for 150–400Å of gate oxide are increasingly reduced by increasing dopant concentration, increasing activation temperature, and increasing activation time. In a highly doped polysilicon, gate process for submicron CMOS, defect densities in the gate oxide are shown to be near 10 cm−2 after or As+, self‐aligned, source/drain implant and activation. On the other hand, after a low dose implant and activation such as used in a silicided polygate process, the defect density is only 0.002 cm−2. These results can have a large effect on megabit memory yields." @default.
- W2074437611 created "2016-06-24" @default.
- W2074437611 creator A5041296025 @default.
- W2074437611 date "1987-03-01" @default.
- W2074437611 modified "2023-09-27" @default.
- W2074437611 title "Gate Oxide Degradation in the Polysilicon Doping/Activation Process" @default.
- W2074437611 doi "https://doi.org/10.1149/1.2100534" @default.
- W2074437611 hasPublicationYear "1987" @default.
- W2074437611 type Work @default.
- W2074437611 sameAs 2074437611 @default.
- W2074437611 citedByCount "15" @default.
- W2074437611 countsByYear W20744376112015 @default.
- W2074437611 countsByYear W20744376112016 @default.
- W2074437611 countsByYear W20744376112017 @default.
- W2074437611 crossrefType "journal-article" @default.
- W2074437611 hasAuthorship W2074437611A5041296025 @default.
- W2074437611 hasConcept C119599485 @default.
- W2074437611 hasConcept C127413603 @default.
- W2074437611 hasConcept C165801399 @default.
- W2074437611 hasConcept C172385210 @default.
- W2074437611 hasConcept C191897082 @default.
- W2074437611 hasConcept C191952053 @default.
- W2074437611 hasConcept C192562407 @default.
- W2074437611 hasConcept C2361726 @default.
- W2074437611 hasConcept C25356406 @default.
- W2074437611 hasConcept C2779679103 @default.
- W2074437611 hasConcept C2779851234 @default.
- W2074437611 hasConcept C2780081452 @default.
- W2074437611 hasConcept C46362747 @default.
- W2074437611 hasConcept C49040817 @default.
- W2074437611 hasConcept C51140833 @default.
- W2074437611 hasConcept C57863236 @default.
- W2074437611 hasConceptScore W2074437611C119599485 @default.
- W2074437611 hasConceptScore W2074437611C127413603 @default.
- W2074437611 hasConceptScore W2074437611C165801399 @default.
- W2074437611 hasConceptScore W2074437611C172385210 @default.
- W2074437611 hasConceptScore W2074437611C191897082 @default.
- W2074437611 hasConceptScore W2074437611C191952053 @default.
- W2074437611 hasConceptScore W2074437611C192562407 @default.
- W2074437611 hasConceptScore W2074437611C2361726 @default.
- W2074437611 hasConceptScore W2074437611C25356406 @default.
- W2074437611 hasConceptScore W2074437611C2779679103 @default.
- W2074437611 hasConceptScore W2074437611C2779851234 @default.
- W2074437611 hasConceptScore W2074437611C2780081452 @default.
- W2074437611 hasConceptScore W2074437611C46362747 @default.
- W2074437611 hasConceptScore W2074437611C49040817 @default.
- W2074437611 hasConceptScore W2074437611C51140833 @default.
- W2074437611 hasConceptScore W2074437611C57863236 @default.
- W2074437611 hasIssue "3" @default.
- W2074437611 hasLocation W20744376111 @default.
- W2074437611 hasOpenAccess W2074437611 @default.
- W2074437611 hasPrimaryLocation W20744376111 @default.
- W2074437611 hasRelatedWork W1510429101 @default.
- W2074437611 hasRelatedWork W1948237163 @default.
- W2074437611 hasRelatedWork W2001994306 @default.
- W2074437611 hasRelatedWork W2046500450 @default.
- W2074437611 hasRelatedWork W2046708502 @default.
- W2074437611 hasRelatedWork W2049017294 @default.
- W2074437611 hasRelatedWork W2060902693 @default.
- W2074437611 hasRelatedWork W2153961634 @default.
- W2074437611 hasRelatedWork W2165689927 @default.
- W2074437611 hasRelatedWork W3174760063 @default.
- W2074437611 hasVolume "134" @default.
- W2074437611 isParatext "false" @default.
- W2074437611 isRetracted "false" @default.
- W2074437611 magId "2074437611" @default.
- W2074437611 workType "article" @default.