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• W2074461570 abstract "We have successfully prepared Cu–Al–O films on silicon (100) and quartz substrates with copper and aluminum composite target by using radio frequency (RF) magnetron sputtering method. We have related the structural and optical-electrical properties of the films to the sputtering area ratio of Cu/Al for the target (<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M1><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>). The deposition rate of the film and<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M2><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>can be fitted by an exponential function.<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M3><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>plays a critical role in the final phase constitution and the preferred growth orientation of the CuAlO 2 phase, thus affecting the film surface morphology significantly. The film with main phase of CuAlO 2 has been obtained with<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M4><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>of 45%. The films show p-type conductivity. With the increase of<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M5><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>, the electrical resistivity decreases first and afterwards increases again. With<mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M6><mml:mrow><mml:msub><mml:mi>r</mml:mi><mml:mrow><mml:mtext>Cu/Al</mml:mtext></mml:mrow></mml:msub></mml:mrow></mml:math>of 45%, the optimum electrical resistivity of 80 <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML id=M7><mml:mi>Ω</mml:mi><mml:mo>·</mml:mo></mml:math>cm is obtained, with the optical transmittance being 72%–79% in the visible region (400–760 nm). The corresponding direct band gap and indirect band gap are estimated to be 3.6 eV and 1.7 eV, respectively." @default.
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• W2074461570 date "2012-01-01" @default.
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• W2074461570 title "Optical and Electrical Properties of Magnetron Sputtering Deposited Cu–Al–O Thin Films" @default.
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• W2074461570 doi "https://doi.org/10.1155/2012/823089" @default.
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