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- W2074572902 abstract "The band gap shift in the 80×80μm2 crack-free GaN∕AlN multilayers on the mesh-patterned Si(111) has been characterized by cathodoluminescence (CL) and Raman techniques. The GaN band gap derived from CL spectra depends on the spatial point inside a mesh, which changes from 3.413eV (at center) to 3.418eV (at edge) and to 3.426eV (at corner). The band gap shift is attributed to the variation of tensile stress inside the mesh, confirmed by Raman mapping. The shift of GaN band gap per unit stress is determined to be 0.03eV∕GPa." @default.
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- W2074572902 date "2006-04-17" @default.
- W2074572902 modified "2023-09-23" @default.
- W2074572902 title "Band gap shift in the GaN∕AlN multilayers on the mesh-patterned Si(111)" @default.
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- W2074572902 doi "https://doi.org/10.1063/1.2193043" @default.
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