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• W2074802022 endingPage "2609" @default.
• W2074802022 startingPage "2604" @default.
• W2074802022 abstract "The redistribution of Fe and Ti implanted into InP and its recrystallization is studied using &lt;m1;37.6p&gt;various thermal annealing techniques. Fe and Ti profiles are measured by secondary-ion mass spectroscopy and recrystallization by Rutherford backscattering channeling. Ti shows absolutely superior thermal stability under any circumstances as compared to Fe. Iron always accumulates at the surface and at a depth of approximately twice the projected range Rp. After high-dose implantation Fe additionally accumulates in the 0.8Rp region. At similar doses Ti still shows no diffusion and only faint accumulation between the surface and Rp." @default.
• W2074802022 created "2016-06-24" @default.
• W2074802022 creator A5002001441 @default.
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• W2074802022 date "1991-09-01" @default.
• W2074802022 modified "2023-10-03" @default.
• W2074802022 title "Redistribution of Fe and Ti implanted into InP" @default.
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• W2074802022 doi "https://doi.org/10.1063/1.349370" @default.
• W2074802022 hasPublicationYear "1991" @default.
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