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- W2074986083 abstract "Abstract We have studied the atomic structure of the surface and interface of VO X /TiO 2 (110) by X‐ray photoelectron diffraction (XPED). The TiO 2 (110) crystal surface was cleaned by cycles of Ar + sputtering followed by annealing. The TiO 2 (110) crystal surface was deoxidized by annealing. Therefore, TiO 2 (110) crystal surface was annealed in oxygen atmosphere. Vanadium oxides were deposited by two processes. In process A, vanadium was first deposited on the TiO 2 crystal and then oxidized in an O 2 atmosphere. In process B, vanadium was deposited in an atmosphere of low‐pressure O 2 . We characterized the VO X ultrathin film grown on the TiO 2 (110) surface by low‐energy electron diffraction (LEED), X‐ray photoelectron spectroscopy (XPS), and XPED. Finally the surface and interface structures of the VO X /TiO 2 (110) were clarified by using the multiple scattering cluster model with spherical wave (MSC‐SW) method and a reliability factor R ( R factor). Copyright © 2008 John Wiley & Sons, Ltd." @default.
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- W2074986083 date "2008-06-23" @default.
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- W2074986083 title "Surface and interface structural analysis of VO<i>X</i>/TiO<sub>2</sub>(110) by X-ray photoelectron diffraction" @default.
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- W2074986083 doi "https://doi.org/10.1002/sia.2885" @default.
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