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- W2075294175 abstract "High-resolution electrical resistivity measurements (ρ,dρ/dT) were performed in three series of [Fe30ÅCrtÅ] multilayers in the temperature range 15–300 K, both at zero and under saturation magnetic field. The different series were prepared by MBE on MgO (100) substrates, by sputtering on MgO (100) substrates, and by sputtering on Si (100) substrates. In the temperature range 15 K≲T<50 K we always observe ρ=βT3 where β is a sample-dependent constant, indicating the dominance of phonon-assisted interband (s-d) electron scattering (ρ∝T3 when T≪ΘDebye). For the samples grown on MgO we observe that β decreases with t(Cr) whereas for the samples grown on Si, the coefficient β increases with t. For T>150 K the resistivity attains the classical dependence with ρ∝T also predicted by this s-d model. In spite of these differences our results show that ρ=βf(T) where f(T) is the same function of temperature for all the different samples studied." @default.
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- W2075294175 date "1997-04-15" @default.
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- W2075294175 title "Electrical resistivity behavior of Fe/Cr multilayers deposited by different techniques (molecular-beam epitaxy, sputtering), on different substrates (MgO,Si)" @default.
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- W2075294175 doi "https://doi.org/10.1063/1.364463" @default.
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