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- W2075544819 abstract "The thermal stability of epitaxial silicon-carbon alloys grown by molecular beam epitaxy on (001) silicon was investigated using high resolution x-ray diffraction, transmission electron microscopy, and secondary ion mass spectroscopy measurements. Different superlattices, with alloy compositions of Si0.997C0.003, Si0.992C0.008, and Si0.985C0.015, all nominally 6 nm thick, with 24 nm Si spacer layers were employed. Annealing studies determined that there are different pathways to strain relaxation in this material system. At annealing temperatures of 900 °C and below, the structures relax only by interdiffusion, indicating that these layers are stable during typical device processing steps. At temperatures of 1000 °C and above, SiC precipitation dominates with enhanced precipitation in the Si1−xCx layers with the highest initial carbon content." @default.
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- W2075544819 date "1992-06-01" @default.
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- W2075544819 title "Thermal stability of Si1−<i>x</i>C<i>x</i>/Si strained layer superlattices" @default.
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- W2075544819 doi "https://doi.org/10.1063/1.106868" @default.
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