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- W2075557315 abstract "In situ dc oxygen‐discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya‐Namioka beamline for gas‐phase experiments showed a flux enhancement amounting to a factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon K edge." @default.
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- W2075557315 date "1989-07-01" @default.
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- W2075557315 title "<i>In</i> <i>situ</i> dc oxygen‐discharge cleaning system for optical elements" @default.
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- W2075557315 doi "https://doi.org/10.1063/1.1140869" @default.
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