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- W2076070104 abstract "An investigation has been made into plasma kinetics mechanisms of an optimized copper vapour laser by applying a genetic algorithm: (1) an impedance resonance of the thyratron takes place when the pulsed laser appears, and the matching between the laser tube and the discharging circuit is well improved by the optimization; (2) both the rapidly rising plasma electron temperature and the increasing electron density pump more particles so as to populate more quickly the upper laser levels during the discharging pulsed period after the optimization; (3) maintenance of a high wall temperature can increase the lasing population." @default.
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- W2076070104 date "2000-05-04" @default.
- W2076070104 modified "2023-09-27" @default.
- W2076070104 title "Plasma kinetics mechanisms of an optimized copper vapour laser" @default.
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- W2076070104 doi "https://doi.org/10.1088/0022-3727/33/10/306" @default.
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