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• W2076170623 startingPage "481" @default.
• W2076170623 abstract "In this work, we deposited 5%Ta–5%Cr–In2O3 film on LaAlO3(001) substrate as an example to investigate the effect of electron doping, oxygen partial pressure and thickness on the ferromagnetism. The ferromagnetism is strongly dependent on oxygen partial pressure. Films deposited under low oxygen partial pressure leads to the enhancement of ferromagnetism. However, the electron doping through Ta dopant has a limit influence on the magnetism, suggesting that the film may not be carrier-mediated. Through the X-ray magnetic circular dichroism study, no magnetic moment can be found in Cr, In and O edge, suggesting that the ferromagnetism may be originated from defects. Magnetoresistance and anomalous Hall effect can be observed at low temperature in the film deposited under low oxygen partial pressure. Hence, these two properties may not be as an indication of intrinsic ferromagnetism." @default.
• W2076170623 created "2016-06-24" @default.
• W2076170623 creator A5011678759 @default.
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• W2076170623 date "2013-03-01" @default.
• W2076170623 modified "2023-10-02" @default.
• W2076170623 title "Ferromagnetism in Cr doped In2O3" @default.
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• W2076170623 doi "https://doi.org/10.1016/j.tsf.2013.01.040" @default.
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