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- W2076184401 abstract "Metastable quenching spectroscopy (MQS), temperature-programmed desorption (TPD), high-resolution electron energy loss spectroscopy (HREELS), and Auger electron spectroscopy (AES) were used to study the reaction of NO on GaAs(100) at 74–77 K. Adsorbed NO reacts nearly completely to form N2O and surface oxide. A NO dose of about 200 L saturates the reaction, forming a complete oxide layer. The MQ spectra show that the product N2O is adsorbed predominately with the O atom down on the oxide layer, resulting in a 30% higher saturation coverage than for N2O adsorbed on the clean surface. Dosing the clean surface at 300 K with 200 L NO gave no measurable NO adsorption, N2O production, or surface oxide formation." @default.
- W2076184401 created "2016-06-24" @default.
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- W2076184401 date "1992-04-01" @default.
- W2076184401 modified "2023-10-14" @default.
- W2076184401 title "Reaction of NO to form N2O and surface oxide on GaAs(100)" @default.
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- W2076184401 doi "https://doi.org/10.1016/0039-6028(92)90510-d" @default.
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