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• W2076233685 abstract "In this work, silicon dioxide (SiO 2 ) films were fabricated on indium tin oxide (ITO) coated glass substrates by radio frequency (RF) magnetron sputtering deposition technique. The deposition rate of the magnetron sputtered SiO 2 films was investigated. The SiO 2 films were characterized with the atomic force microscopy (AFM) for their surface topology. In addition, the electrical insulating strength of the magnetron sputtered SiO 2 was examined." @default.
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• W2076233685 date "2014-06-01" @default.
• W2076233685 modified "2023-09-27" @default.
• W2076233685 title "Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films" @default.
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• W2076233685 doi "https://doi.org/10.4028/www.scientific.net/amr.970.102" @default.
• W2076233685 hasPublicationYear "2014" @default.
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