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• W2076273836 abstract "Abstract The III–V compound gallium antimonide (GaSb), which has a relatively narrow band gap, is of increasing importance for the fabrication of optoelectronic devices. However, the material was shown to swell during high energy ion implantation or under low energy cesium bombardment used for secondary ion mass spectrometry (SIMS), at 14.5 keV. Here, the phenomenon has been investigated under cesium and oxygen bombardment, between 1.25 and 14.5 keV, with doses from 1015cm−2 to above 1017cm−2. The swelling occurred independently of the nature of primary ions and the mechanism is related to the damage caused by the primary ion bombardment rather than to the presence of oxygen, as previously proposed. In the case of SIMS both swelling and sputtering occur simultaneously; preferential sputtering reveals microcrystals whose dimensions depend on both the thicknesses of damaged layers, hence the penetration depths of primary ions, and the beam impact angles. The phenomenon has two major influences on SIMS measurements in (AlGa)Sb structures: it deteriorates the depth resolution and it modifies the elemental ion yields above certain doses." @default.
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• W2076273836 date "1993-06-01" @default.
• W2076273836 modified "2023-10-02" @default.
• W2076273836 title "Swelling of GaSb at low energies (1.3–14.5 keV)" @default.
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• W2076273836 doi "https://doi.org/10.1016/0168-583x(93)96177-e" @default.
• W2076273836 hasPublicationYear "1993" @default.
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