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- W2076286512 abstract "Reflection high-energy electron diffraction patterns show that the crystal orientation of MgO films deposited on amorphous substrates at 30 °C at normal vapor incidence varies with film thickness. Films in the thickness range of 50 Å to less than 1000 Å have a random orientation. As the film thickness is increased a 〈 111 〉 preferred orientation develops. The 〈 111 〉 preferred orientation remains unchanged upon annealing in vacuum at a temperature in the range from 400 to 550 °C for 1 h. The origin of these orientations is discussed." @default.
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- W2076286512 title "Preferred orientations in MgO films deposited on amorphous substrates" @default.
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- W2076286512 doi "https://doi.org/10.1063/1.1655210" @default.
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