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- W2076296050 abstract "Abstract Silicon carbide (SiC) precipitates buried in Si(1 0 0) substrates were synthesized by ion implantation of 50 keV and 150 keV C + ions at different fluences. Two sets of samples were subsequently annealed at 850 °C and 1000 °C for 30 min. Fourier transform infrared (FTIR) spectroscopy studies and X-ray diffraction (XRD) analysis confirmed formation of β-SiC precipitates in the samples. Ion irradiation with 100 MeV Ag 7+ ions at room temperature does not induce significant change in the precipitates. It could be interpreted from the FTIR observations that ion irradiation may induce nucleation in Si + C solution created by ion implantation of C in Si. Modifications induced by swift heavy ion irradiation are found to be dependent on implantation energy of C + ions." @default.
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- W2076296050 date "2007-07-01" @default.
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- W2076296050 title "Influence of SHI irradiation on the formation of buried SiC" @default.
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- W2076296050 doi "https://doi.org/10.1016/j.nimb.2007.04.213" @default.
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