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- W2076423323 abstract "On boron-doped, CZ silicon samples, having an average oxygen content of 1018 atoms cm−3, the influence of thermal annealing in controlled atmospheres on the electrical activity of dislocations was investigated using the light-beam-induced current technique, while the segregation of oxygen was followed using Fourier transform infrared spectroscopy. It was found that the electrical activity of dislocations is small or negligible until oxide precipitation occurs, indicating that a point defect cloud, originated as a consequence of the oxide phase formation and frozen around dislocations during the consequent cooling down of the samples, is responsible for their room temperature electrical activity." @default.
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- W2076423323 date "1990-09-01" @default.
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- W2076423323 title "LBIC analysis of the electrical activity of dislocations in CZ silicon" @default.
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- W2076423323 doi "https://doi.org/10.1016/0921-5107(90)90011-y" @default.
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