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- W2076479686 abstract "The creation and evolution of linear 〈100〉 defects at the interface of Si3N4 films condensed on Si (100) surfaces are observed by high-flux x-ray topography during the annealing of the Si wafer in flowing nitrogen. These defects are sources for tangled dislocations that develop upon further annealing in oxygen. A mechanism of the gettering at the Si3N4-Si interface is proposed." @default.
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- W2076479686 date "1982-08-01" @default.
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- W2076479686 title "Synchrotron x‐ray topographic observation of defect evolution at the Si‐ Si<sub>3</sub>N<sub>4</sub>interface" @default.
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