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• W2076481804 abstract "Hydrogenated amorphous carbon (a-C:H) films have been prepared by r.f. plasma-enhanced chemical vapor deposition at low bias voltage from 0 to −40 V with CH4 and H2 as raw materials. The a-C:H films deposited with no bias applied showed characteristics of polymeric films with a large fluorescence level while the a-C:H films deposited at a bias voltage of r.f. 150 W showed characteristics from diamond-like carbon to graphitic nature with a significantly reduced fluorescence level. High water-repellency of over 140° in a contact angle obtained at a-C:H/trimetylmethoxysilane/Si structures. This high water-repellency is due to CH groups on surfaces and the roughness." @default.
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• W2076481804 date "2003-01-01" @default.
• W2076481804 modified "2023-10-18" @default.
• W2076481804 title "Characteristics and high water-repellency of a-C:H films deposited by r.f. PECVD" @default.
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• W2076481804 doi "https://doi.org/10.1016/s0257-8972(02)00704-1" @default.
• W2076481804 hasPublicationYear "2003" @default.
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