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• W2076653139 abstract "This paper proposes a double epi-layers 4H–SiC junction barrier Schottky rectifier (JBSR) with embedded P layer (EPL) in the drift region. The structure is characterized by the P-type layer formed in the n-type drift layer by epitaxial overgrowth process. The electric field and potential distribution are changed due to the buried P-layer, resulting in a high breakdown voltage (BV) and low specific on-resistance (Ron;sp). The influences of device parameters, such as the depth of the embedded P+ regions, the space between them and the doping concentration of the drift region, etc., on BV and Ron;sp are investigated by simulations, which provides a particularly useful guideline for the optimal design of the device. The results indicate that BV is increased by 48.5% and Baliga’s figure of merit (BFOM) is increased by 67.9% compared to a conventional 4H–SiC JBSR." @default.
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• W2076653139 date "2010-08-01" @default.
• W2076653139 modified "2023-09-24" @default.
• W2076653139 title "Study of a double epi-layers SiC junction barrier Schottky rectifiers embedded P layer in the drift region" @default.
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• W2076653139 doi "https://doi.org/10.1088/1674-1056/19/8/087202" @default.
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