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- W2076659390 abstract "We present data that indicate that for ${mathrm{O}}_{2}$ deposited onto a Kr film, the desorption of ${mathrm{O}}^{mathrm{ensuremath{-}}}$ following the dissociative electron attachment (DEA) of 6 eV electrons can occur only if the molecule resides at the film surface. For submonolayer quantities of ${mathrm{O}}_{2}$, the ${mathrm{O}}^{mathrm{ensuremath{-}}}$ signal is a function of the ${mathrm{O}}_{2}$ coverage and thus may be used as a probe of the ${mathrm{O}}_{2}$ surface concentration. With this method, ${mathrm{O}}_{2}$ molecules originally buried within a multilayer Kr film are observed to diffuse to the surface for various overlayer thicknesses deposited at 21 K. These experimental results are compared with calculations based on the solution of the Markovian master equation of the diffusion process. The analysis yields a value of 3ifmmodetimeselsetexttimesfi{}${10}^{mathrm{ensuremath{-}}20}$ ${mathrm{m}}^{2}$/s for the diffusion coefficient of ${mathrm{O}}_{2}$ through Kr to the film surface. It is orders of magnitude higher than predicted from various models based on ${mathrm{O}}_{2}$ diffusion strictly via vacancies. These experiments indicate the possibility of using DEA as a probe to measure the concentration of molecular surface impurities on molecular solids and dielectrics." @default.
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- W2076659390 date "1993-08-15" @default.
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- W2076659390 title "Measuring diffusion in thin films by dissociative electron attachment:O2in Kr" @default.
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- W2076659390 doi "https://doi.org/10.1103/physrevb.48.5540" @default.
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