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- W2076807151 abstract "In this paper, a comprehensive study of different level hot carrier stress conditions for N-type symmetrical lateral double diffused MOS (ns-LDMOS) is carried out. It is noted that there are two peaks bulk current observed for different gate voltage due to Kirk effect happening. The experimental results show two turn-over of Idsat degradation with low Vgs (mainly caused by impact ionization current increase), and one turn-over of Idsat degradation with median Vgs, which is caused by interface states generation. For high Vgs condition, significant damage is occurred on ns-LDMOS. A series of EFA and PFA demonstrate that this damage is not caused by hot carrier injection, but the self-heating effect in body of ns-LDMOS." @default.
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- W2076807151 date "2014-06-01" @default.
- W2076807151 modified "2023-09-27" @default.
- W2076807151 title "The degradation of N-type symmetrical lateral double diffused MOS with different gate voltage stress condition" @default.
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- W2076807151 doi "https://doi.org/10.1109/edssc.2014.7061094" @default.
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