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• W2076847982 abstract "A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature and used as masks for metal patterning. Additionally, vapor-deposited polymer layers are selectively patterned to produce bifunctional surfaces. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article." @default.
• W2076847982 created "2016-06-24" @default.
• W2076847982 creator A5014408132 @default.
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• W2076847982 date "2012-09-26" @default.
• W2076847982 modified "2023-10-07" @default.
• W2076847982 title "Initiated Chemical Vapor Deposition-Based Method for Patterning Polymer and Metal Microstructures on Curved Substrates" @default.
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• W2076847982 doi "https://doi.org/10.1002/adma.201201975" @default.
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