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- W2076908148 abstract "Europium thin films were grown on various substrates by the molecular-beam epitaxy technique. X-ray diffraction and in situ reflection high-energy electron diffraction observations revealed that the europium thin films possessed a textured structure with Eu(110) planes which were self oriented parallel to the substrate, independent of the type of substrate. In situ electron-beam irradiation induced transformation of the textured Eu(100) plane to the [111] in-plane orientation. Thus, using this method europium thin films could be locally crystallized to a single phase at growth temperatures above 170 K. It was found necessary to use electron-beam irradiation during the initial growth stage in order to obtain the in-plane orientation." @default.
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- W2076908148 date "1990-11-01" @default.
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- W2076908148 title "In situ electron beam irradiation induced in-plane orientation of europium thin film grown by the molecular beam epitaxy technique" @default.
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- W2076908148 doi "https://doi.org/10.1016/0040-6090(90)90484-u" @default.
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