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• W2076937344 abstract "We report on the preparation of polydimethylsiloxane stamps with selectively grown polymer sidewalls by chemical vapor deposition polymerization of poly(p-xylylene). Using a thin iron layer as an inhibitor, the deposition occurs only on the sidewalls of the features in relief, resulting in a polymer-reinforced stamp. The wetting properties of stamps can be restored after removing the thin iron layer with an acidic solution, which has been verified by pattern transfer to an underlying substrate using molding and microcontact printing." @default.
• W2076937344 created "2016-06-24" @default.
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• W2076937344 date "2003-11-12" @default.
• W2076937344 modified "2023-10-09" @default.
• W2076937344 title "Fabrication of elastomeric stamps with polymer-reinforced sidewalls via chemically selective vapor deposition polymerization of poly(<i>p</i>-xylylene)" @default.
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• W2076937344 doi "https://doi.org/10.1063/1.1628392" @default.
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