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- W2076946673 abstract "An alkali-soluble silicone resin, acetylated phenylsilsesquioxane oligomer (APSQ), was synthesized from phenylsilsesquioxane oligomer by Friedel Crafts acetylation. Silanol groups are simultaneously formed in APSQ through this acetylation. The presence of silanol groups makes APSQ soluble in alkaline aqueous solutions. Silicone-based results composed of APSQ and sensitizers were prepared for ultraviolet (u.v.), deep u.v., electron beam and X-ray lithographies. These resists based on APSQ can be developed with alkaline aqueous solutions and have high resistance to oxygen reactive ion etching." @default.
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- W2076946673 date "1990-03-01" @default.
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- W2076946673 title "Synthesis of alkali-soluble silicone resin suitable for resist material in microlithography" @default.
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- W2076946673 doi "https://doi.org/10.1016/0032-3861(90)90403-l" @default.
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