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- W2076957612 abstract "The temperature dependence of ultrathin ${text{ZrO}}_{2}$ films on clean $(2ifmmodetimeselsetexttimesfi{}1)$-reconstructed Si(100) was studied by means of x-ray photoelectron spectroscopy and photoelectron diffraction (XPD). ${text{ZrO}}_{2}$ films with a thickness of approximately $11text{ }text{AA{}}$ were grown by electron-beam evaporation. At temperatures of $650text{ }ifmmode^circelsetextdegreefi{}text{C}$ and above it was found that the zirconia $({text{ZrO}}_{2})$ films were transformed into ${text{ZrSi}}_{2}$. The temperature region of structural transformation could be narrowed to the range from 650 to $725text{ }ifmmode^circelsetextdegreefi{}text{C}$. During the formation of ${text{ZrSi}}_{2}$ all oxygen was removed from the sample surface. After annealing at $725text{ }ifmmode^circelsetextdegreefi{}text{C}$ neither zirconia nor silicon oxide could be verified on the sample. Scanning electron microscopy (SEM) measurements showed the ${text{ZrSi}}_{2}$ being arranged in islands on the surface after annealing. From the combined spectroscopy, SEM, and XPD analysis a model for the internal structure of ${text{ZrSi}}_{2}$ is proposed." @default.
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- W2076957612 date "2009-10-20" @default.
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- W2076957612 title "Thermal stability of ultrathinZrO2films and structure determination ofZrSi2islands on Si(100)" @default.
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- W2076957612 doi "https://doi.org/10.1103/physrevb.80.165323" @default.
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