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- W2077121476 abstract "Polymorphous silicon–germanium (pm-SiGe:H) thin films with Ge contents varying from 1 to 35% were fabricated by plasma enhanced chemical vapour deposition in a high pressure range (1350 mtorr) and under high hydrogen dilution. The electrical and optical properties of these films were studied using a set of complementary techniques. These materials were then incorporated in the i layer of p–i–n solar cells. The performance of such solar cells and the use of these pm-SiGe alloys as the bottom cell of tandem pm-Si:H/pm-SiGe:H cells are finally discussed with the help of numerical simulations." @default.
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- W2077121476 date "2003-03-01" @default.
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- W2077121476 title "Study of pm-SiGe:H thin films for p–i–n devices and tandem solar cells" @default.
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- W2077121476 doi "https://doi.org/10.1016/s0040-6090(02)01196-3" @default.
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