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- W2077277144 abstract "The emission channeling technique using position sensitive detection of α-particles was applied to locate the lattice sites of ion-implanted 8Li in high-resistivity p-type Si. Below room temperature mainly tetrahedral and substitutional sites are occupied by the Li atoms. Above room temperature the diffusing Li is captured by defects probably containing oxygen or implantation-induced vacancies." @default.
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- W2077277144 date "1992-01-01" @default.
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- W2077277144 title "Lattice site changes of ion implanted 8Li in Si studied by alpha emission channeling" @default.
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- W2077277144 doi "https://doi.org/10.1016/0168-583x(92)95175-q" @default.
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