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- W2077442009 abstract "It is demonstrated that the spin-lattice relaxation rate for thallium nuclei in the glassy semiconductor ${mathrm{Tl}}_{2}$Se${mathrm{As}}_{2}$${mathrm{Te}}_{3}$ between 130 and 300 K is limited by spin diffusion and is a thermally activated (Arrhenius) process. These facts indicate that the dominant relaxation mechanism is provided by thermally activated localized electronic states in the gap whose density can be estimated from the measured spin-lattice relaxation time." @default.
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- W2077442009 title "Nuclear Spin-Lattice Relaxation by Localized Electronic States in an Amorphous Semiconductor" @default.
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- W2077442009 doi "https://doi.org/10.1103/physrevlett.40.1204" @default.
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