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- W2077528093 abstract "Abstract Strained and relaxed Si0.95Sn0.05 films grown by molecular beam epitaxy with enriched 119Sn on silicon and Si1−xGex substrates, respectively, have been investigated by 119Sn conversion electron Mossbauer spectroscopy. The Sn concentration exceeds the maximum solid solubility of ≈0.01%, however, the Sn atoms are found to be located on substitutional sites in the matrices. Upon annealing to temperatures ≥800 K the formation of first α-Sn and then β-Sn precipitates has been followed. Pronouncedly, different precipitation effects found upon an ion implantation of the samples are also briefly reported." @default.
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- W2077528093 date "2000-08-01" @default.
- W2077528093 modified "2023-09-28" @default.
- W2077528093 title "Precipitation of Sn in metastable, pseudomorphic Si0.95Sn0.05 films grown by molecular beam epitaxy" @default.
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- W2077528093 doi "https://doi.org/10.1016/s1369-8001(00)00040-8" @default.
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