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- W2077620891 abstract "Ultrathin Si (001) layers (<15 nm) are hydrophobic bonded to a full 4 in. Si (001) wafer. The interface quality and surface roughness, checked by specular x-ray reflectivity, are very good. This technique, well suited to measure the homogeneity thickness, shows that the samples have very small thickness fluctuations, and no extended defects. Quantitative analysis proves that the interfacial layer resulting from the bonding is very thin (about 8 Å). Its atomic density is significantly different from bulk Si only for large bonding twist angles (>5°)." @default.
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- W2077620891 date "1999-11-29" @default.
- W2077620891 modified "2023-09-30" @default.
- W2077620891 title "X-ray reflectivity of ultrathin twist-bonded silicon wafers" @default.
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- W2077620891 doi "https://doi.org/10.1063/1.125371" @default.
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