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- W2077640535 abstract "La mesure des épaisseurs de couches d'oxyde de titane par spectroscopie électronique pour analyse chimique est discutée à partir de résultats de distribution angulaire des photoélectrons. Les conditions d'analyse permettant de s'affranchir d'effets secondaires tels que rugosité ou inhomogénéité de couche ont été déterminées. La croissance des couches d'oxydes est analysée à partir du modèle d'oxydation à basse température proposé par Mott et al.; l'influence de la pression d'oxydation sur l'épaisseur des couches est reliée à une sélectivité des sites dans le processus d'adsorption, mais le rôle joué par le mode de préparation de la surface métallique reste assez mal compris. The measurement of the thickness of titanium oxide layers by electron spectroscopy for chemical analysis is discussed on the basis of the angular distribution of photoelectrons. The conditions of analysis necessary to avoid secondary effects such as roughness or inhomogeneity of the oxide layer were determined. The growth of oxide layers is analysed using the low temperature oxidation model of Mott et al.; the influence of the pressure during oxidation on the thickness of the layers is related to the selectivity of the surface sites for the adsorption process; however, the influence of the method of preparation of the surface is still not well understood." @default.
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- W2077640535 date "1980-01-01" @default.
- W2077640535 modified "2023-09-27" @default.
- W2077640535 title "Croissance des couches d'oxyde de titane par oxydation sèche à 25 °c" @default.
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- W2077640535 doi "https://doi.org/10.1016/0022-5088(80)90053-3" @default.
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