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- W2077692310 startingPage "063527" @default.
- W2077692310 abstract "A method to calculate growth stress in SiO2 scales formed during SiC fiber oxidation was developed. Calculations were done for Hi-NicalonTM-S SiC fibers using previously measured Deal-Grove oxidation kinetics parameters. Initial compressive stresses in SiO2 of ∼25 GPa from the 2.2× oxidation volume expansion are rapidly relaxed to lower levels by flow of silica with a shear-stress dependent viscosity. At >1200°, viscous flow of silica relaxes stress to negligible levels. At 700° – 900 °C, compressive axial and hoop stress at the GPa level persist, but radial stresses are much smaller. The decrease in growth stress with increase in temperature is a consequence of larger activation energy for silica viscosity than for oxidation kinetics. Radial expansion of the outer scale eventually causes hoop stress to become tensile in the outer scale, and axial stress becomes tensile from the Poisson effect. Tensile hoop stresses can be >1 GPa for thick scales formed at <1000 °C. Approximate analytical expressions for ..." @default.
- W2077692310 created "2016-06-24" @default.
- W2077692310 creator A5075111522 @default.
- W2077692310 date "2012-03-15" @default.
- W2077692310 modified "2023-10-04" @default.
- W2077692310 title "Growth stress in SiO<sub>2</sub> during oxidation of SiC fibers" @default.
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- W2077692310 doi "https://doi.org/10.1063/1.3698305" @default.
- W2077692310 hasPublicationYear "2012" @default.
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