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• W2077801210 abstract "The structure of an ordered, ultrathin Al2O3 film grown on a NiAl(110) single-crystal surface and its interaction with D2O were studied by low-energy ion scattering spectroscopy (LEISS), X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and infrared reflection absorption spectroscopy (IRAS). LEISS demonstrated that the surface was mainly terminated by an oxygen layer, and TPD data of adsorbed D2O revealed that most of the water desorbed molecularly from Al2O3/NiAl(110). However, a small amount of dissociated water molecules during adsorption and/or TPD measurements was observed, and as a consequence the alumina film thickness increased after water adsorption/desorption. These results suggest that atomic oxygen and/or hydroxyl species, which are formed by dissociation of water, interact with subsurface aluminum atoms through defect sites and cause the increase in the alumina film thickness. In addition, a few monolayers of water can be transformed from the amorphous solid water (ASW) to the crystalline ice (CI) phase, as seen by IRAS." @default.
• W2077801210 created "2016-06-24" @default.
• W2077801210 creator A5073959546 @default.
• W2077801210 creator A5076149777 @default.
• W2077801210 date "2007-11-01" @default.
• W2077801210 modified "2023-09-23" @default.
• W2077801210 title "D₂O Adsorption on an Ultrathin Alumina Film on NiAl(110)" @default.
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• W2077801210 doi "https://doi.org/10.1021/jp074459s" @default.
• W2077801210 hasPublicationYear "2007" @default.
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