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• W2077814220 startingPage "025201" @default.
• W2077814220 abstract "In this paper, the structural and electrical modifications induced, in the nanoscale, by a rapid thermal oxidation process on AlGaN/GaN heterostructures, are investigated. A local rapid oxidation (900 ° C in O2, 10 min) localized under the anode region of an AlGaN/GaN diode enabled a reduction of the leakage current with respect to a standard Schottky contact. The insulating properties of the near-surface oxidized layer were probed by a nanoscale electrical characterization using scanning probe microscopy techniques. The structural characterization indicated the formation of a thin uniform oxide layer on the surface, with preferential oxidation paths along V-shaped defects penetrating through the AlGaN/GaN interface. The oxidation process resulted in an expansion of the lattice parameters due to the incorporation of oxygen atoms, accompanied by an increase of the crystal mosaicity. As a consequence, a decrease of the sheet carrier density of the two-dimensional electron gas and a positive shift of the threshold voltage are observed. The results provide useful insights for a possible future integration of rapid oxidation processes during GaN device fabrication." @default.
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• W2077814220 date "2013-12-12" @default.
• W2077814220 modified "2023-09-23" @default.
• W2077814220 title "Nanoscale electrical and structural modification induced by rapid thermal oxidation of AlGaN/GaN heterostructures" @default.
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• W2077814220 doi "https://doi.org/10.1088/0957-4484/25/2/025201" @default.
• W2077814220 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/24334374" @default.
• W2077814220 hasPublicationYear "2013" @default.
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